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Low pressure microwave glow discharge process for high deposition rate amorphous silicon alloy
S.J Hudgens, A.G Johncock, S.R OvshinskyVolume:
77-78
Year:
1985
Language:
english
DOI:
10.1016/0022-3093(85)90783-5
File:
PDF, 147 KB
english, 1985