Quantitative infrared characterization of plasma enhanced...

Quantitative infrared characterization of plasma enhanced CVD silicon oxynitride films

J.C. Rostaing, Y. Cros, S.C. Gujrathi, S. Poulain
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Volume:
97-98
Year:
1987
Language:
english
DOI:
10.1016/0022-3093(87)90252-3
File:
PDF, 187 KB
english, 1987
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