Quantitative infrared characterization of plasma enhanced CVD silicon oxynitride films
J.C. Rostaing, Y. Cros, S.C. Gujrathi, S. PoulainVolume:
97-98
Year:
1987
Language:
english
DOI:
10.1016/0022-3093(87)90252-3
File:
PDF, 187 KB
english, 1987