An XPS study of XeF2 dry etching of tungsten silicide

An XPS study of XeF2 dry etching of tungsten silicide

E. Grossman, A. Bensaoula, A. Ignatiev
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
197
Year:
1988
Language:
english
DOI:
10.1016/0039-6028(88)90575-4
File:
PDF, 690 KB
english, 1988
Conversion to is in progress
Conversion to is failed