Diffuse scattering in the high-temperature “1 × 1” state of...

Diffuse scattering in the high-temperature “1 × 1” state of GeSi(111) surfaces

Shigehiko Hasegawa, Makoto Akizuki, Hiroshi Iwasaki, Ikuhiro Yoneda, Shogo Nakamura
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Volume:
235
Year:
1990
Language:
english
DOI:
10.1016/0039-6028(90)90099-t
File:
PDF, 339 KB
english, 1990
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