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Surface reactions during the a-Si : H growth in the diode and triode glow-discharge reactors
J.-L Guizot, K Nomoto, A MatsudaVolume:
244
Year:
1991
Language:
english
DOI:
10.1016/0039-6028(91)90166-p
File:
PDF, 1.74 MB
english, 1991