Influence of O2 and oxide on Cl/Si surface reactions

Surface Science 1991 Vol. 247; Iss. 1

Influence of O2 and oxide on Cl/Si surface reactions

Nahomi Aoto, Eiji Ikawa, Takamaro Kikkawa, Yukinori Kurogi
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Volume:
247
Year:
1991
Language:
english
DOI:
10.1016/0039-6028(91)90191-t
File:
PDF, 906 KB
english, 1991
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