Influence of silicon X-ray photoelectron diffraction on quantitative surface analysis
L. Kubler, F. Lutz, J.L. Bischoff, D. BolmontVolume:
251-252
Year:
1991
Language:
english
DOI:
10.1016/0039-6028(91)91003-g
File:
PDF, 530 KB
english, 1991