X-ray photoelectron spectroscopic characterization of...

Surface Science 1992 Vol. 279; Iss. 1-2

X-ray photoelectron spectroscopic characterization of ultra-thin silicon oxide films on a Mo(100) surface

J-W. He, X. Xu, J.S. Corneille, D.W. Goodman
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Volume:
279
Year:
1992
Language:
english
DOI:
10.1016/0039-6028(92)90748-u
File:
PDF, 757 KB
english, 1992
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