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Dry etching of GaAs with Cl2: correlation between the surface Cl coverage and the etching rate at steady state
Su Chaochin, Xi Ming, Dai Zi-Guo, Matthew F. Vernon, Brian E. BentVolume:
282
Year:
1993
Language:
english
DOI:
10.1016/0039-6028(93)90940-l
File:
PDF, 1.55 MB
english, 1993