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X-ray diffraction peak profile analysis of TiNx films prepared on silicon by reactive ion beam assisted deposition
P. Scardi, D.C. Kothari, L. GuzmanVolume:
195
Year:
1991
Language:
english
DOI:
10.1016/0040-6090(91)90273-z
File:
PDF, 697 KB
english, 1991