Optical lithography and O2/RIE pattern transfer...

Microelectronic Engineering 1989 Vol. 9; Iss. 1-4

Optical lithography and O2/RIE pattern transfer characteristics of the silicon-containing positiv resist (SPR)

Rainer Leuschner, Recai Sezi, Michael Sebald, Guenter Czech, Dietrich Stephani
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Volume:
9
Year:
1989
Language:
english
DOI:
10.1016/0167-9317(89)90117-2
File:
PDF, 855 KB
english, 1989
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