Molecular design and development of photoresists for ArF excimer laser lithography
Etsuo Hasegawa, Katsumi Maeda, Shigeyuki IwasaVolume:
11
Year:
2000
Language:
english
Pages:
10
DOI:
10.1002/1099-1581(200008/12)11:8/123.0.co;2-o
File:
PDF, 277 KB
english, 2000