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Organosilicon function of gas barrier films purely deposited by inductively coupled plasma chemical vapor deposition system
Tung-Ying Lin, Ching-Ting LeeVolume:
542
Year:
2012
Language:
english
DOI:
10.1016/j.jallcom.2012.07.053
File:
PDF, 1.27 MB
english, 2012