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Effects of DC Bias on the Microstructure, Residual Stress and Hardness Properties of TiVCrZrTaN Films by Reactive RF Magnetron Sputtering
Chao-Te Lee, Wen-Hao Cho, Ming-Hua Shiao, Chien-Nan Hsiao, Kuo-Sheng Tang, Cheng-Chung JaingVolume:
36
Year:
2012
Language:
english
DOI:
10.1016/j.proeng.2012.03.046
File:
PDF, 304 KB
english, 2012