SiGe Sputter Epitaxy Technique and Its Application to SiGe...

Procedia Engineering 2012 Vol. 36; Iss. none

SiGe Sputter Epitaxy Technique and Its Application to SiGe Devices

Yoshiyuki Suda, Hiroaki Hanafusa, Mitsuhiro Yoshikawa, Manabu Kanazawa
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Volume:
36
Year:
2012
Language:
english
DOI:
10.1016/j.proeng.2012.03.058
File:
PDF, 504 KB
english, 2012
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