Etching characteristics of silicon oxide using amorphous...

Etching characteristics of silicon oxide using amorphous carbon hard mask in dual-frequency capacitively coupled plasma

J.H. Lee, B.S. Kwon, N.-E. Lee
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Volume:
521
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.02.047
File:
PDF, 977 KB
english, 2012
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