Performance of organic field effect transistors with high-k...

Thin Solid Films 2012 Vol. 521; Iss. none

Performance of organic field effect transistors with high-k gate oxide after application of consecutive bias stress

Sunwoo Lee, Changhwan Choi, Kilbock Lee, Joong Hwee Cho, Ki-Young Ko, Jinho Ahn
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Volume:
521
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.03.078
File:
PDF, 692 KB
english, 2012
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