Effect of the very high frequency plasma with a balanced...

Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition

Hiroshi Muta, Kenta Mizuno, Satoshi Nishida, Shizuma Kuribayashi
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Volume:
523
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.06.012
File:
PDF, 836 KB
english, 2012
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