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Spectroscopic ellipsometry analysis of TiO2 films deposited by plasma enhanced chemical vapor deposition in oxygen/titanium tetraisopropoxide plasma
D. Li, M. Carette, A. Granier, J.P. Landesman, A. GoulletVolume:
522
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.07.091
File:
PDF, 1.01 MB
english, 2012