Very low surface recombination velocity of boron doped emitter passivated with plasma-enhanced chemical-vapor-deposited AlOx layers
Pierre Saint-Cast, Armin Richter, Etienne Billot, Marc Hofmann, Jan Benick, Jochen Rentsch, Ralf Preu, Stefan W. GlunzVolume:
522
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.08.050
File:
PDF, 753 KB
english, 2012