Non-constant diffusion characteristics of nanoscopic Mo–Si...

Thin Solid Films 2012 Vol. 522; Iss. none

Non-constant diffusion characteristics of nanoscopic Mo–Si interlayer growth

J. Bosgra, J. Verhoeven, R.W.E. van de Kruijs, A.E. Yakshin, F. Bijkerk
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Volume:
522
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.08.051
File:
PDF, 755 KB
english, 2012
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