Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor
M. Degai, K. Kanomata, K. Momiyama, S. Kubota, K. Hirahara, F. HiroseVolume:
525
Year:
2012
Language:
english
DOI:
10.1016/j.tsf.2012.10.043
File:
PDF, 626 KB
english, 2012