Role of substrate temperature during diamond film growth using the newly developed time-modulated chemical vapor deposition process
N. Ali, Y. Kousar, Q. H. Fan, V. F. Neto, J. GracioVolume:
22
Language:
english
DOI:
10.1023/a:1024705812865
Date:
July, 2003
File:
PDF, 392 KB
english, 2003