Plasma cleaning of Si surfaces for TiO2 film deposition

Electronics and Communications in Japan (Part II: Electronics)) 2000 Vol. 83; Iss. 7

Plasma cleaning of Si surfaces for TiO2 film deposition

Akira Shibata, Kazumaro Kita, Kunio Okimura
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Volume:
83
Year:
2000
Language:
english
Pages:
5
DOI:
10.1002/1520-6432(200007)83:73.0.co;2-t
File:
PDF, 155 KB
english, 2000
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