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Selective epitaxial growth of Si thin films by ECR plasma CVD
Toshiaki Takada, Kimihiro SasakiVolume:
83
Year:
2000
Language:
english
Pages:
6
DOI:
10.1002/1520-6432(200008)83:83.0.co;2-g
File:
PDF, 899 KB
english, 2000