Selective epitaxial growth of Si thin films by ECR plasma...

Selective epitaxial growth of Si thin films by ECR plasma CVD

Toshiaki Takada, Kimihiro Sasaki
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Volume:
83
Year:
2000
Language:
english
Pages:
6
DOI:
10.1002/1520-6432(200008)83:83.0.co;2-g
File:
PDF, 899 KB
english, 2000
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