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Initial silicide formation process of Mo/(100) Si system prepared using an ultrahigh-vacuum sputtering system
Naoya Ohishi, Hideto Yanagisawa, Katsutaka Sasaki, Yoshio AbeVolume:
84
Year:
2001
Language:
english
Pages:
8
DOI:
10.1002/1520-6432(200103)84:33.0.co;2-o
File:
PDF, 136 KB
english, 2001