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A study of the surface reaction on the etched ITO thin films by using inductively coupled plasma
Kim, Han-Soo, Woo, Jong-Chang, Joo, Young-Hee, Kim, Chang-IlVolume:
93
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2012.11.015
Date:
July, 2013
File:
PDF, 1.05 MB
english, 2013