SiCN Amorphous Materials Chemical Vapour Deposited Using...

Journal de Physique IV (Proceedings) /Le Journal de Physique IV 1995 / 06 Vol. 5; Iss. C5

SiCN Amorphous Materials Chemical Vapour Deposited Using the Si(CH 3 ) 4 -NH 3 -H 2 System

Bendeddouche, A., Berjoan, R., Bêche, E., Schamm, S., Serin, V., Carles, R., Hillel, R.
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Volume:
5
Language:
english
Journal:
Le Journal de Physique IV
DOI:
10.1051/jphyscol:1995594
Date:
June, 1995
File:
PDF, 490 KB
english, 1995
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