ChemInform Abstract: Stabilization of Tetragonal HfO 2 under Low Active Oxygen Source Environment in Atomic Layer Deposition.
Cho, Deok-Yong, et al., et al.Volume:
43
Journal:
ChemInform
DOI:
10.1002/chin.201247020
Date:
November, 2012
File:
PDF, 21 KB
2012