Effect of chemical composition of SiOx films on rapid formation of Si nanocrystals induced by thermal plasma jet irradiation
Tatsuya Okada, Seiichiro Higashi, Hirotaka Kaku, Katsunori Makihara, Hirokazu Furukawa, Yasuo Hiroshige, Seiichi MiyazakiVolume:
7
Year:
2010
Language:
english
DOI:
10.1002/pssc.200982804
File:
PDF, 172 KB
english, 2010