Preparation of Boron–Silicon Thin Film by Pulsed Laser Deposition and Its Properties
Masatoshi Takeda, Masahiro Ichimura, Hideshi Yamaguchi, Yoshiko Sakairi, Kaoru KimuraVolume:
154
Year:
2000
Language:
english
Pages:
4
DOI:
10.1006/jssc.2000.8824
File:
PDF, 133 KB
english, 2000