Preparation of Boron–Silicon Thin Film by Pulsed Laser...

Preparation of Boron–Silicon Thin Film by Pulsed Laser Deposition and Its Properties

Masatoshi Takeda, Masahiro Ichimura, Hideshi Yamaguchi, Yoshiko Sakairi, Kaoru Kimura
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Volume:
154
Year:
2000
Language:
english
Pages:
4
DOI:
10.1006/jssc.2000.8824
File:
PDF, 133 KB
english, 2000
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