The change of properties of the dehydroxylated SiO2 layer...

Materials Letters 1991 Vol. 11; Iss. 3-4

The change of properties of the dehydroxylated SiO2 layer surface during gas adsorption in the temperature range 20–400°C

F.N. Dultsev, S.M. Repinsky, V.N. Kruchinin, M.R. Baklanov, E.R. Chernakov
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Volume:
11
Year:
1991
Language:
english
DOI:
10.1016/0167-577x(91)90098-q
File:
PDF, 507 KB
english, 1991
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