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Low-pressure chemical vapor deposition of titanium and zirconium carbonitride thin films from M(NEt2)4 (M = Ti and Zr)
Chiu Hsin-Tien, Huang Cheng-ChungVolume:
16
Year:
1993
Language:
english
DOI:
10.1016/0167-577x(93)90162-q
File:
PDF, 750 KB
english, 1993