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High quality amorphous–crystalline silicon heterostructure prepared by grid-biased remote radio-frequency plasma enhanced chemical vapor deposition
Pratish Mahtani, Keith R. Leong, Bastien Jovet, Davit Yeghikyan, Nazir P. KheraniVolume:
358
Year:
2012
Language:
english
DOI:
10.1016/j.jnoncrysol.2012.08.015
File:
PDF, 603 KB
english, 2012