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Photo-patternable fluorinated polyhedral oligomeric silsequioxane-functionalized (POSS-F) polymeric materials with ultra low dielectric constants
Maria Vasilopoulou, Antonios M. Douvas, Panagiotis ArgitisVolume:
135
Year:
2012
Language:
english
DOI:
10.1016/j.matchemphys.2012.05.073
File:
PDF, 377 KB
english, 2012