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Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films
Hoonbae Kim, Myung Hoon Ha, Donggeun Jung, Heeyeop Chae, Hyoungsub KimVolume:
47
Year:
2012
Language:
english
DOI:
10.1016/j.materresbull.2012.04.097
File:
PDF, 271 KB
english, 2012