Tunneling oxide engineering by ion implantation of nitrogen...

Microelectronic Engineering 2013 Vol. 103; Iss. none

Tunneling oxide engineering by ion implantation of nitrogen for 3D vertical silicon pillar SONOS flash memory

Jae-Sub Oh, Seong-Dong Yang, Sang-Youl Lee, Young-Su Kim, Min-Ho Kang, Sung-Kyu Lim, Hi-Deok Lee, Ga-Won Lee
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Volume:
103
Year:
2013
Language:
english
DOI:
10.1016/j.mee.2012.08.005
File:
PDF, 585 KB
english, 2013
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