All evaporation submicron lift-off lithography process with...

Microelectronic Engineering 2013 Vol. 103; Iss. none

All evaporation submicron lift-off lithography process with negative e-beam QSR-5 resist

Jean-Claude Gerbedoen, Abdelkader Aliane, Alexandre Giguère, Dominique Drouin, Richard Ares, Vincent Aimez
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Volume:
103
Year:
2013
Language:
english
DOI:
10.1016/j.mee.2012.10.006
File:
PDF, 468 KB
english, 2013
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