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Characterization of Ti diffusion in PVD deposited WTi/AlCu metallization on monocrystalline Si by means of secondary ion mass spectroscopy
M. Plappert, O. Humbel, A. Koprowski, M. NowottnickVolume:
52
Year:
2012
Language:
english
DOI:
10.1016/j.microrel.2012.06.066
File:
PDF, 692 KB
english, 2012