Wafer scale and reliability investigation of thin...

Microelectronics Reliability 2012 Vol. 52; Iss. 9-10

Wafer scale and reliability investigation of thin HfO2·AlGaN/GaN MIS-HEMTs

A. Fontserè, A. Pérez-Tomás, P. Godignon, J. Millán, H. De Vleeschouwer, J. M. Parsey, P. Moens
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
52
Year:
2012
Language:
english
DOI:
10.1016/j.microrel.2012.06.131
File:
PDF, 1.43 MB
english, 2012
Conversion to is in progress
Conversion to is failed