Robust pixel-based source and mask optimization for inverse...

Optics & Laser Technology 2013 Vol. 45; Iss. none

Robust pixel-based source and mask optimization for inverse lithography

Sikun Li, Xiangzhao Wang, Yang Bu
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Volume:
45
Year:
2013
Language:
english
DOI:
10.1016/j.optlastec.2012.06.033
File:
PDF, 1.28 MB
english, 2013
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