Oxygen Partial Pressure Dependence of the Properties of...

Procedia Engineering 2012 Vol. 32; Iss. none

Oxygen Partial Pressure Dependence of the Properties of TiO2 Thin Films Deposited by DC Reactive Magnetron Sputtering

M. Horprathum, P. Eiamchai, P. Chindaudom, A. Pokaipisit, P. Limsuwan
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Volume:
32
Year:
2012
Language:
english
DOI:
10.1016/j.proeng.2012.01.1326
File:
PDF, 535 KB
english, 2012
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