Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering
C. Paksunchai, S. Denchitcharoen, S. Chaiyakun, P. LimsuwanVolume:
32
Year:
2012
Language:
english
DOI:
10.1016/j.proeng.2012.02.026
File:
PDF, 429 KB
english, 2012