Reducing stiction in microelectromechanical systems by...

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

R.L. Puurunen, A. Häärä, H. Saloniemi, J. Dekker, M. Kainlauri, H. Pohjonen, T. Suni, J. Kiihamäki, E. Santala, M. Leskelä, H. Kattelus
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Volume:
188
Year:
2012
Language:
english
DOI:
10.1016/j.sna.2012.01.040
File:
PDF, 692 KB
english, 2012
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