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Electrical properties of amorphous NI-B films prepared by ion implantation and sputtering
A. Benyagoub, L. Thomé, A. Audouard, A. Chamberod, K. Królas, P. WodnieckiVolume:
87
Year:
1986
Language:
english
DOI:
10.1016/s0022-3093(86)80073-4
File:
PDF, 300 KB
english, 1986