Si photo etching in Cl2 Gas using a high power Hg lamp

Surface Science 1987 Vol. 183; Iss. 1-2

Si photo etching in Cl2 Gas using a high power Hg lamp

Eiji Ikawa, Shigeyuki Sugito, Yukinori Kurogi
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Volume:
183
Year:
1987
Language:
english
DOI:
10.1016/s0039-6028(87)80350-3
File:
PDF, 815 KB
english, 1987
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