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Ab initio calculations on (SiH3)2F+: stability in the gas phase and model for bridging fluorine atom in ion-implanted amorphous silicon
Edgar W. Ignacio, H.Bernhard Schlegel, Jozef BiceranoVolume:
127
Year:
1986
Language:
english
Pages:
7
DOI:
10.1016/0009-2614(86)80297-4
File:
PDF, 527 KB
english, 1986