![](/img/cover-not-exists.png)
The initial photochemical process of triosmiumdodecacarbonyl adsorbed on the surface of silica as studied by picosecond diffuse reflectance laser photolysis and matrix isolation
Sadaaki Yamamoto, Hirokazu Mizuma, Atsuhiko Nitta, Norimasa Fukazawa, Hiroshi Fukumura, Hiroshi MasuharaVolume:
215
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0009-2614(93)85722-z
File:
PDF, 512 KB
english, 1993