Oxide HDP-CVD Modeling for Shallow Trench Isolation

IEEE Transactions on Semiconductor Manufacturing 2010 Vol. 23; Iss. 3

Oxide HDP-CVD Modeling for Shallow Trench Isolation

Roussy, A., Delachet, L., Belharet, D., Pinaton, J., Collot, P.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
23
Year:
2010
Language:
english
DOI:
10.1109/tsm.2010.2051749
File:
PDF, 8.05 MB
english, 2010
Conversion to is in progress
Conversion to is failed