Numerical simulation of MOCVD-process for YBCO thin film...

Numerical simulation of MOCVD-process for YBCO thin film fabrication in stagnation point reactor

Sergey E Khoruzhnikov, Andrey M Robachevsky, Alexander S Segal
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Volume:
32
Year:
1992
Language:
english
Pages:
4
DOI:
10.1016/0011-2275(92)90241-2
File:
PDF, 272 KB
english, 1992
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