Numerical simulation of MOCVD-process for YBCO thin film fabrication in stagnation point reactor
Sergey E Khoruzhnikov, Andrey M Robachevsky, Alexander S SegalVolume:
32
Year:
1992
Language:
english
Pages:
4
DOI:
10.1016/0011-2275(92)90241-2
File:
PDF, 272 KB
english, 1992